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Please use this identifier to cite or link to this item: https://hdl.handle.net/10923/24963
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dc.contributor.authorMODEL, JOSÉ CRISTIANO MENGUE-
dc.contributor.authorMOEHLECKE, ADRIANO-
dc.contributor.authorIzete Zanesco-
dc.contributor.authorLY, MOUSSA-
dc.contributor.authorMARCONDES, TATIANA LISBOA-
dc.date.accessioned2023-04-25T17:34:39Z-
dc.date.available2023-04-25T17:34:39Z-
dc.date.issued2022-
dc.identifier.issn1980-5373-
dc.identifier.urihttps://hdl.handle.net/10923/24963-
dc.language.isoen-
dc.relation.ispartofMATERIALS RESEARCH-
dc.rightsopenAccess-
dc.subjectCélulas Solares-
dc.subjectPassivação-
dc.subjectFilme Antirreflexo de TiO2-
dc.subjectDióxido de titânio-
dc.titleTiO2 Antireflection Coating Deposited by Electro-Beam Evaporation: Thin Film Thickness Effect on Weighted Reflectance and Surface Passivation of Silicon Solar Cells-
dc.typeArticle-
dc.date.updated2023-04-25T17:34:38Z-
dc.identifier.doiDOI:10.1590/1980-5373-mr-2022-0245-
dc.jtitleMATERIALS RESEARCH-
dc.volume25-
dc.spagee20220245-
Appears in Collections:Artigo de Periódico

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